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Tantalum(V) ethoxide, 99.999% (metals basis), Nb <100ppm
Description
Tantalum(V) ethoxide acts as a precursor used in the preparation of ultra thin films of tantalum oxide and other tantalum containing films, which finds application in semiconductors. It is also used to prepare tantalum oxide nanoparticles for the imaging cartilage.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Specifications
Specifications
| Melting Point | 18°C to 19°C |
| Density | 1.566 g/mL |
| Boiling Point | 145°C (0.1 mmHg) |
| Flash Point | 30°C (87°F) |
| Linear Formula | Ta(OCH2CH3)5 |
| Refractive Index | 1.488 |
| Quantity | 10 g |
| UN Number | UN2924 |
| Beilstein | 3678999 |
| Sensitivity | Air and moisture sensitive |
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RUO – Research Use Only
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